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What is Monolithic IC Fabrication Process Steps about?
The document summarizes the 9 basic steps in the production process of monolithic integrated circuits (ICs): 1) A P-type silicon wafer is used as the substrate. 2) An N-type epitaxial layer is grown on the substrate. 3) A silicon dioxide insulation layer is grown on the epitaxial layer. 4) Photolithography is used to selectively etch areas of the silicon dioxide layer. 5) Isolation diffusion creates isolated N-type regions separated by P-type material. 6) Base diffusion creates P-type regions for component
- Author
- Amanda Spence
- Language
- EN