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About this Engineering article
Early Stage of Polycrystalleve Growth of Ge and SiGe by Reactive Thermal Cvd from GeF4 and Si2H6 by Hanna, Jun-Ichi; Ohuchi, Takayuki; Yamamoto, Masaji is a Engineering article available to read on EtoBox.
It is typically read by researchers, students, and practitioners in Engineering.
- Author
- Hanna, Jun-Ichi; Ohuchi, Takayuki; Yamamoto, Masaji
- Publisher
- Cambridge University Press; Cambridge University Press (Materials Research Society); Cambridge University Press (CUP) (ISSN 0272-9172)
- Published
- 1994
- Language
- EN
- Field
- Engineering (Physical Sciences)
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