About this scholarly article

IEEE International Electron Devices Meeting 2003 - Poly-Si TFT fabricated at 150°C using ICP-CVD and excimer laser annealing for plastic substrates by Min-Cheol Lee, ; Sang-Myeon Han, ; Su-Hyuk Kang, ; Moon-Young Shin, ; Min-Koo Han, is a scholarly article available to read on EtoBox.

Author

Min-Cheol Lee, ; Sang-Myeon Han, ; Su-Hyuk Kang, ; Moon-Young Shin, ; Min-Koo Han,

Publisher

IEEE

Published

2003

Language

EN