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About this Engineering article
Effects of Substrate Temperature on the Properties of Silicon Oxide Films by PECVD by Li, Chun Ya; Li, Xi Feng; Chen, Long Long; Shi, Ji Feng; Zhang, Jian Hua is a Engineering article available to read on EtoBox.
It is typically read by researchers, students, and practitioners in Engineering.
- Author
- Li, Chun Ya; Li, Xi Feng; Chen, Long Long; Shi, Ji Feng; Zhang, Jian Hua
- Publisher
- Trans Tech Publications Inc.; Trans Tech Publications, Ltd.; Scitec Publications Ltd. (ISSN 1660-9336)
- Published
- 2012
- Language
- EN
- Field
- Engineering (Physical Sciences)
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