About this scholarly article

SPIE Proceedings [SPIE SPIE's 1996 International Symposium on Microlithography - Santa Clara, CA (Sunday 10 March 1996)] Advances in Resist Technology and Processing XIII - Novel main chain scission positive-tone photoresists for 248-nm lithography with wide post-exposure processing latitude as an alternative to chemically amplified systems by McMurdie, Neil D.; O'Dwyer, James B.; Kunz, Roderick R. is a scholarly article available to read on EtoBox.

Author

McMurdie, Neil D.; O'Dwyer, James B.; Kunz, Roderick R.

Publisher

SPIE

Published

1996

Language

EN