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Micromachines 13 01293 V2 by Niharika Kulshrestha is a document available to read on EtoBox.

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The document presents a comparative analysis of 14 nm FinFET and NWFET transistor structures using TCAD modeling to evaluate their electrical and thermal performances. It discusses the advantages of NWFETs, such as better layout efficiency and improved electrostatic control, while also addressing challenges like self-heating effects. The study aims to optimize VLSI characteristics for sub-14 nm technologies by analyzing key output parameters including Ion, Io f f, SS, Vth, and Tmax.

Author

Niharika Kulshrestha

Language

EN