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About this Engineering article
Electromigration in Short Al Lines Studied by High-Resolution Resistance Measurement by Verbruggen, A. H.; Van Den Homberg, M. J. C.; Jacobs, L. C.; Kalkman, A. J.; Kraayeveld, J. R.; Radelaar, S. is a Engineering article available to read on EtoBox.
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- Author
- Verbruggen, A. H.; Van Den Homberg, M. J. C.; Jacobs, L. C.; Kalkman, A. J.; Kraayeveld, J. R.; Radelaar, S.
- Publisher
- Cambridge University Press; Cambridge University Press (Materials Research Society); Cambridge University Press (CUP) (ISSN 0272-9172)
- Published
- 1997
- Language
- EN
- Field
- Engineering (Physical Sciences)