Opening book details…
About this Materials Science article
Efficient Process for Direct Atomic Layer Deposition of Metallic Cu Thin Films Based on an Organic Reductant by Tripathi, Tripurari S.; Karppinen, Maarit is a Materials Science article available to read on EtoBox.
It is typically read by researchers, students, and practitioners in Materials Science.
- Author
- Tripathi, Tripurari S.; Karppinen, Maarit
- Publisher
- American Chemical Society; American Chemical Society (ACS) (ISSN 0897-4756)
- Published
- 2017
- Language
- EN
- Field
- Materials Science (Physical Sciences)
More by Tripathi, Tripurari S.; Karppinen, Maarit
Browse all works by Tripathi, Tripurari S.; Karppinen, Maarit