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About this Engineering article
Radical and Electron Densities in a High Plasma Density-chemical Vapor Deposition Reactor from a Three-dimensional Simulation by Keiter, E.R.; Kushner, M.J. is a Engineering article available to read on EtoBox.
It is typically read by researchers, students, and practitioners in Engineering.
- Author
- Keiter, E.R.; Kushner, M.J.
- Publisher
- IEEE; Institute of Electrical and Electronics Engineers; Institute of Electrical and Electronics Engineers (IEEE) (ISSN 0093-3813)
- Published
- 1999
- Field
- Engineering (Physical Sciences)