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About this Engineering article
C 2 F 6 /O 2 /Ar Plasma Chemistry of 60 MHz/2 MHz Dual-Frequency Discharge and Its Effect on Etching of SiCOH Low- k Films by Yuan, Ying; Ye, Chao; Chen, Tian; Ge, Shuibing; Liu, Huimin; Cui, Jin; Xu, Yijun; Deng, Yanhong; Ning, Zhaoyuan is a Engineering article available to read on EtoBox.
It is typically read by researchers, students, and practitioners in Engineering.
- Author
- Yuan, Ying; Ye, Chao; Chen, Tian; Ge, Shuibing; Liu, Huimin; Cui, Jin; Xu, Yijun; Deng, Yanhong; Ning, Zhaoyuan
- Publisher
- IOP Publishing; Institute of Physics Publishing (ISSN 1009-0630)
- Published
- 2012
- Language
- EN
- Field
- Engineering (Physical Sciences)