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About this Physics and Astronomy article
The Effects of Plasma Exposure and Vacuum Ultraviolet Irradiation on Photopatternable Low-k Dielectric Materials by Nichols, M. T.; Mavrakakis, K.; Lin, Q.; Shohet, J. L. is a Physics and Astronomy article available to read on EtoBox.
It is typically read by researchers, students, and practitioners in Physics and Astronomy.
- Author
- Nichols, M. T.; Mavrakakis, K.; Lin, Q.; Shohet, J. L.
- Publisher
- American Institute of Physics; AIP Publishing; Publons (ISSN 0021-8979)
- Published
- 2013
- Field
- Physics and Astronomy (Physical Sciences)
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