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General kinetic ion induced electron emission model for metallic walls applied to biased Z-pinch electrodes by Skolar, Chirag R.; Bradshaw, Kolter; Francisquez, Manaure; Murillo, Lucio; Kumar, Vignesh Krishna; Srinivasan, Bhuvana is a scholarly article available to read on EtoBox.

What is General kinetic ion induced electron emission model for metallic walls applied to biased Z-pinch electrodes about?

A generalized kinetic ion induced electron emission (IIEE) model is developed to obtain the emitted electron energy spectrum for a distribution of ion impacts on a metallic surface. This framework is implemented as a boundary condition for the continuum kinetic Boltzmann equation. The IIEE model is used to study how emissions affect sheath formation near biased Z-pinch electrodes. 1X-1V (one spatial and one velocity dimension) Boltzmann-Poisson simulations are performed for a proton-electron plasma doubly bounded by two biased copper electrodes with and without IIEE at bias potentials from 0 kV to 9 kV. The ions are accelerated to higher energies by the sheath potentials at the electrodes inducing electron emission. The secondary electron yield (SEY), defined as the ratio of the flux of emitted electrons to impacting ions, increases with bias potential at both electrodes, but more significantly at the cathode. Despite the SEY crossing 1 at 7 kV, a classical sheath, rather than a space-charge limited or inverse sheath, forms for all cases. The emitted electrons present as a beam that is accelerated by the sheath potential into the domain resulting in increased electron temperatures

Author

Skolar, Chirag R.; Bradshaw, Kolter; Francisquez, Manaure; Murillo, Lucio; Kumar, Vignesh Krishna; Srinivasan, Bhuvana

Published

2025

Language

EN