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About this Engineering article
Post drain-stress behavior of AlGaN/GaN-on-Si MIS-HEMTs by Jauss, Simon A.; Kilian, Stefan; Schwaiger, Stephan; Noll, Stefan; Daves, Walter; Ambacher, Oliver is a Engineering article available to read on EtoBox.
It is typically read by researchers, students, and practitioners in Engineering.
- Author
- Jauss, Simon A.; Kilian, Stefan; Schwaiger, Stephan; Noll, Stefan; Daves, Walter; Ambacher, Oliver
- Publisher
- Elsevier Science; Elsevier ; Elsevier Ltd.; Elsevier BV (ISSN 0038-1101)
- Published
- 2016
- Language
- EN
- Field
- Engineering (Physical Sciences)