About this scholarly article

Digest of Papers. Microprocesses and Nanotechnology '99. 1999 International Microprocesses and Nanotechnology Conference - Chemically amplified electron beam positive resist with acetal protecting group by Saito, S.; Kihara, N.; Ushirogouchi, T.; Nakasugi, T. is a scholarly article available to read on EtoBox.

Author

Saito, S.; Kihara, N.; Ushirogouchi, T.; Nakasugi, T.

Publisher

Japan Society of Applied Physics

Published

1999