About this scholarly article

SPIE Proceedings [SPIE SPIE's 1994 Symposium on Microlithography - San Jose, CA (Sunday 27 February 1994)] Optical/Laser Microlithography VII - Some image modeling issues for I-line, 5X phase-shifting masks by Wojcik, Gregory L.; Mould, Jr., John; Ferguson, Richard A.; Martino, Ronald M.; Low, K. K.; Brunner, Timothy A. is a scholarly article available to read on EtoBox.

Author

Wojcik, Gregory L.; Mould, Jr., John; Ferguson, Richard A.; Martino, Ronald M.; Low, K. K.; Brunner, Timothy A.

Publisher

SPIE

Published

1994

Language

EN