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About this Engineering article
Strain partition of Si/SiGe and SiO2/SiGe on compliant substrates by Yin, H.; Hobart, K. D.; Kub, F. J.; Shieh, S. R.; Duffy, T. S.; Sturm, J. C. is a Engineering article available to read on EtoBox.
It is typically read by researchers, students, and practitioners in Engineering.
- Author
- Yin, H.; Hobart, K. D.; Kub, F. J.; Shieh, S. R.; Duffy, T. S.; Sturm, J. C.
- Publisher
- American Institute of Physics; AIP Publishing (ISSN 0003-6951)
- Published
- 2003
- Field
- Engineering (Physical Sciences)
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