About this Engineering article
Interaction effects between arsenic and boron ions implanted in silicon during furnace annealing and RTA by Li Guohui; Ma Yi; Zhang Tonghe; Luo Yan is a Engineering article available to read on EtoBox.
It is typically read by researchers, students, and practitioners in Engineering.
- Author
- Li Guohui; Ma Yi; Zhang Tonghe; Luo Yan
- Publisher
- Elsevier Science; Elsevier ; Elsevier Ltd.; Elsevier BV (ISSN 0042-207X)
- Published
- 1989
- Field
- Engineering (Physical Sciences)