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About this Engineering article
Doping characteristics of BF2+ implants in 〈100〉 and 〈111〉 silicon by Drobny, V.F.; Rubalcava, J. is a Engineering article available to read on EtoBox.
It is typically read by researchers, students, and practitioners in Engineering.
- Author
- Drobny, V.F.; Rubalcava, J.
- Publisher
- IEEE; Institute of Electrical and Electronics Engineers; Institute of Electrical and Electronics Engineers (IEEE) (ISSN 0018-9383)
- Published
- 2001
- Language
- EN
- Field
- Engineering (Physical Sciences)