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About this Engineering article
Atomic layer deposition of titanium nitride from TDMAT precursor by J. Musschoot; Q. Xie; D. Deduytsche; S. Van den Berghe; R.L. Van Meirhaeghe; C. Detavernier is a Engineering article available to read on EtoBox.
It is typically read by researchers, students, and practitioners in Engineering.
- Author
- J. Musschoot; Q. Xie; D. Deduytsche; S. Van den Berghe; R.L. Van Meirhaeghe; C. Detavernier
- Publisher
- Elsevier Science; Elsevier ; Elsevier BV (ISSN 0167-9317)
- Published
- 2009
- Language
- EN
- Field
- Engineering (Physical Sciences)