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About this Engineering article

Device performance and bias instability of Ta doped InZnO thin film transistor as a function of process pressure by Park, Hyun-Woo; Kim, Boo-Kyoung; Park, Jin-Seong; Chung, Kwun-Bum is a Engineering article available to read on EtoBox.

It is typically read by researchers, students, and practitioners in Engineering.

Author
Park, Hyun-Woo; Kim, Boo-Kyoung; Park, Jin-Seong; Chung, Kwun-Bum
Publisher
American Institute of Physics; AIP Publishing (ISSN 0003-6951)
Published
2013
Field
Engineering (Physical Sciences)