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SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, United States (Sunday 22 February 2015)] Alternative Lithographic Technologies VII - Template affinity role in CH shrink by DSA planarization by Resnick, Douglas J.; Bencher, Christopher; Tiron, R.; Gharbi, A.; Pimenta Barros, P.; Bouanani, S.; Lapeyre, C.; Bos, S.; Fouquet, A.; Hazart, J.; Chevalier, X.; Argoud, M.; Chamiot-Maitral, G.; Barnola, S.; Monget, C.; Farys, V.; Berard-Bergery, S.; Perraud, L.; Navarro, C.; Nicolet, C.; Hadziioannou, G.; Fleury, G. is a scholarly article available to read on EtoBox.

Author
Resnick, Douglas J.; Bencher, Christopher; Tiron, R.; Gharbi, A.; Pimenta Barros, P.; Bouanani, S.; Lapeyre, C.; Bos, S.; Fouquet, A.; Hazart, J.; Chevalier, X.; Argoud, M.; Chamiot-Maitral, G.; Barnola, S.; Monget, C.; Farys, V.; Berard-Bergery, S.; Perraud, L.; Navarro, C.; Nicolet, C.; Hadziioannou, G.; Fleury, G.
Publisher
SPIE
Published
2015
Language
EN

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