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2012 International Electron Devices Meeting - Study of piezoresistive properties of advanced CMOS transistors: Thin film SOI, SiGe/SOI, unstrained and strained Tri-Gate Nanowires by Casse, M.; Barraud, S.; Le Royer, C.; Koyama, M.; Coquand, R.; Blachier, D.; Andrieu, F.; Ghibaudo, G.; Faynot, O.; Poiroux, T.; Reimbold, G. is a scholarly article available to read on EtoBox.

Author
Casse, M.; Barraud, S.; Le Royer, C.; Koyama, M.; Coquand, R.; Blachier, D.; Andrieu, F.; Ghibaudo, G.; Faynot, O.; Poiroux, T.; Reimbold, G.
Publisher
IEEE
Published
2012
Language
EN

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