About this scholarly article

SPIE Proceedings [SPIE 1989 Microlithography Conferences - San Jose, CA (Monday 27 February 1989)] Electron-Beam, X-Ray, and Ion-Beam Technology: Submicrometer Lithographies VIII - Electron Beam Lithography Using A New Quadrupole Triplet by Okayama, Shigeo; Yanof, Arnold W. is a scholarly article available to read on EtoBox.

Author

Okayama, Shigeo; Yanof, Arnold W.

Publisher

SPIE

Published

1989

Language

EN