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Can I read Protocol for scalable top-down fabrication of InP nanopillars using a self-assembled random mask technique on EtoBox?

Protocol for scalable top-down fabrication of InP nanopillars using a self-assembled random mask technique by Joshua Zheyan Soo; Parvathala Reddy Narangari; Chennupati Jagadish; Hark Hoe Tan; Siva Karuturi is a Biochemistry, Genetics and Molecular Biology article available to read on EtoBox.

What is Protocol for scalable top-down fabrication of InP nanopillars using a self-assembled random mask technique about?

## Summary Nanostructured III-V semiconductors are attractive for solar energy conversion applications owing to their excellent light harvesting and optoelectronic properties. Here, we present a protocol for scalable fabrication of III-V semiconductor nanopillars using a simple and cost-effective top-down approach, combining self-assembled random mask and plasma etching techniques. We describe the deposition of Au/SiO~2~ layers to prepare random etch mask. We then detail the fabrication of nanopillars and photocathodes. Finally, we demonstrate III-V semiconductor nanopillars as a photoelectrode for photoelectrochemical water splitting. For complete details on the use and execution of this protocol, please refer to Narangari et al. (2021).^1^

Who reads Protocol for scalable top-down fabrication of InP nanopillars using a self-assembled random mask technique?

It is typically read by researchers, students, and practitioners in Biochemistry, Genetics and Molecular Biology.

Author
Joshua Zheyan Soo; Parvathala Reddy Narangari; Chennupati Jagadish; Hark Hoe Tan; Siva Karuturi
Publisher
Elsevier BV
Published
2023
Language
EN
Field
Biochemistry, Genetics and Molecular Biology (Life Sciences)

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