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About this Engineering article
Comment on “Plasma etching of high dielectric constant materials on silicon in halogen plasma chemistries” by L. Sha and J. P. Chang [J. Vac. Sci. Technol. A 22, 88 (2004)] by Stafford, Luc; Margot, Joëlle is a Engineering article available to read on EtoBox.
It is typically read by researchers, students, and practitioners in Engineering.
- Author
- Stafford, Luc; Margot, Joëlle
- Publisher
- AVS (American Vacuum Society); American Vacuum Society; American Institute of Physics (ISSN 0734-2101)
- Published
- 2005
- Language
- EN
- Field
- Engineering (Physical Sciences)