Opening book details…
About this Engineering article
Nanocrystalline Si:H films made by inductively coupled plasma using internal low inductance antenna by Wang, W.C.; Jiang, X.X.; Cherng, J.S.; Chen, Q. is a Engineering article available to read on EtoBox.
It is typically read by researchers, students, and practitioners in Engineering.
- Author
- Wang, W.C.; Jiang, X.X.; Cherng, J.S.; Chen, Q.
- Publisher
- Elsevier Science; Elsevier ; Elsevier Ltd.; Elsevier BV (ISSN 1369-8001)
- Published
- 2015
- Field
- Engineering (Physical Sciences)
More by Wang, W.C.; Jiang, X.X.; Cherng, J.S.; Chen, Q.
Browse all works by Wang, W.C.; Jiang, X.X.; Cherng, J.S.; Chen, Q.