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About this Engineering article
The Growth of Silicon Nitride Crystalline Films Using Microwave Plasma Enhanced Chemical Vapor Deposition by Grannen, K.J.; Xiong, F.; Chang, R.P.H. is a Engineering article available to read on EtoBox.
It is typically read by researchers, students, and practitioners in Engineering.
- Author
- Grannen, K.J.; Xiong, F.; Chang, R.P.H.
- Publisher
- Cambridge University Press; Cambridge University Press (Materials Research Society); Cambridge University Press (CUP); Research Square (ISSN 0884-2914)
- Published
- 1994
- Language
- EN
- Field
- Engineering (Physical Sciences)