About this scholarly article

2009 17th International Conference on Advanced Thermal Processing of Semiconductors - Impact of pattern and LSA stitching effects and processing parameters on reflectance and stress distribution for thermal annealing technologies by Mileham, Jeffrey; Willis, James; Owen, David M.; Shetty, Shrinivas; Hebb, Jeff; Wang, Yun is a scholarly article available to read on EtoBox.

Author

Mileham, Jeffrey; Willis, James; Owen, David M.; Shetty, Shrinivas; Hebb, Jeff; Wang, Yun

Publisher

IEEE

Published

2009

Language

EN