About this scholarly article

SPIE Proceedings [SPIE Advanced Lithography - San Jose, CA (Sunday 25 February 2007)] Advances in Resist Materials and Processing Technology XXIV - Organic ArF bottom anti-reflective coatings for immersion lithography by Xiang, Zhong; Lin, Qinghuang; Zhuang, Hong; Wu, Hengpeng; Shan, Jianhui; Abdallah, Dave; Yin, Jian; Mullen, Salem; Yao, Huirong; Gonzalez, Eleazar; Neisser, Mark is a scholarly article available to read on EtoBox.

Author

Xiang, Zhong; Lin, Qinghuang; Zhuang, Hong; Wu, Hengpeng; Shan, Jianhui; Abdallah, Dave; Yin, Jian; Mullen, Salem; Yao, Huirong; Gonzalez, Eleazar; Neisser, Mark

Publisher

SPIE

Published

2007

Language

EN