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About this Computer Science article
Taguchi method–ANN integration for predictive model of intrinsic stress in hydrogenated amorphous silicon film deposited by plasma enhanced chemical vapour deposition by Asafa, T.B.; Tabet, N.; Said, S.A.M. is a Computer Science article available to read on EtoBox.
It is typically read by researchers, students, and practitioners in Computer Science.
- Author
- Asafa, T.B.; Tabet, N.; Said, S.A.M.
- Publisher
- Elsevier Science; Elsevier ; Elsevier BV (ISSN 0925-2312)
- Published
- 2013
- Language
- EN
- Field
- Computer Science (Physical Sciences)