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About this Engineering article
On the growth, orientation and hardness of chemical vapor deposited Ti(C,N) by von Fieandt, L.; Johansson, K.; Larsson, T.; Boman, M.; Lindahl, E. is a Engineering article available to read on EtoBox.
It is typically read by researchers, students, and practitioners in Engineering.
- Author
- von Fieandt, L.; Johansson, K.; Larsson, T.; Boman, M.; Lindahl, E.
- Publisher
- Elsevier Science; Elsevier ; Elsevier Sequoia; Elsevier BV (ISSN 0040-6090)
- Published
- 2018
- Language
- EN
- Field
- Engineering (Physical Sciences)
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