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About this Engineering article
Vacuum deposition techniques in an engineering laboratory facility for producing thin film integrated circuits : R. D. Kraus, IEEE Trans. Prod. Engng. Prodn. (U.S.A.) PEP-7, 3 (1963), pp. 40–47 is a Engineering article available to read on EtoBox.
It is typically read by researchers, students, and practitioners in Engineering.
- Publisher
- Elsevier Science; Elsevier ; Elsevier BV (ISSN 0026-2714)
- Published
- 1964
- Field
- Engineering (Physical Sciences)