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Net positive-charge buildup in various MOS insulators due to high-field stressing by Patrikar, R.M. ;Lal, R. ;Vasi, J. is a Engineering article available to read on EtoBox.

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Author
Patrikar, R.M. ;Lal, R. ;Vasi, J.
Publisher
IEEE; Institute of Electrical and Electronics Engineers; Institute of Electrical and Electronics Engineers (IEEE) (ISSN 0741-3106)
Published
1993
Language
EN
Field
Engineering (Physical Sciences)

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