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About this Engineering article
High dielectric constant Hf–Sn–Ti–O thin films by Schneemeyer, L. F.; van Dover, R. B.; Fleming, R. M. is a Engineering article available to read on EtoBox.
It is typically read by researchers, students, and practitioners in Engineering.
- Author
- Schneemeyer, L. F.; van Dover, R. B.; Fleming, R. M.
- Publisher
- American Institute of Physics; AIP Publishing (ISSN 0003-6951)
- Published
- 1999
- Language
- EN
- Field
- Engineering (Physical Sciences)
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