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About this Engineering article
Dislocation Generation at Si[sub 3]N[sub 4] Film Edges on Silicon Substrates and Viscoelastic Behavior of SiO[sub 2] Films by Isomae, S. is a Engineering article available to read on EtoBox.
It is typically read by researchers, students, and practitioners in Engineering.
- Author
- Isomae, S.
- Publisher
- The Electrochemical Society; Electrochemical Society, Inc. (ISSN 0013-4651)
- Published
- 1979
- Language
- EN
- Field
- Engineering (Physical Sciences)