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What is Remote Hydrogen Plasma Clean for Si about?
The document summarizes a study on using a remote hydrogen plasma clean to clean silicon surfaces prior to epitaxial growth. Key findings include: 1) The remote hydrogen plasma clean effectively removes carbon, nitrogen, and oxygen contamination from silicon surfaces pretreated with a wet chemical clean and HF dip. 2) The clean produces hydrogen-terminated silicon surfaces with ordered monohydride and dihydride coverage, depending on substrate temperature. 3) Both the hydrogen plasma clean and HF dip p
- Author
- Xy
- Language
- EN