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About this Engineering article
Ion-implantation Doping of Semiconductors by L. N. Large; R. W. Bicknell is a Engineering article available to read on EtoBox.
It is typically read by researchers, students, and practitioners in Engineering.
- Author
- L. N. Large; R. W. Bicknell
- Publisher
- Springer; Springer-Verlag; Kluwer Academic Publishers; Springer Science and Business Media LLC; Society for Mining, Metallurgy and Exploration Inc. (ISSN 0022-2461)
- Published
- 1967
- Language
- EN
- Field
- Engineering (Physical Sciences)