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Occurrence of particle debris field during focused Ga ion beam milling of glassy carbon by Qin Hu; William O’Neill is a Materials Science article available to read on EtoBox.

What is Occurrence of particle debris field during focused Ga ion beam milling of glassy carbon about?

To explore the machining characteristics of glassy carbon by focused ion beam (FIB), particles induced by FIB milling on glassy carbon have been studied in the current work. Nano-sized particles in the range of tens of nanometers up to 400 nm can often be found around the area subject to FIB milling. Two ion beam scanning modes -slow single scan and fast repetitive scan -have been tested. Fewer particles are found in single patterns milled in fast repetitive scan mode. For a group of test patterns milled in a sequence, it was found that a greater number of particles were deposited around sites machined early in the sequence. In situ EDX analysis of the particles showed that they were composed of C and Ga. The formation of particles is related to the debris generated at the surrounding areas, the low melting point of gallium used as FIB ion source and the high contact angle of gallium on glassy carbon induces de-wetting of Ga and the subsequent formation of Ga particles. Ultrasonic cleaning can remove over 98% of visible particles. The surface roughness (R a ) of FIB milled areas after cleaning is less than 2 nm.

Who reads Occurrence of particle debris field during focused Ga ion beam milling of glassy carbon?

It is typically read by researchers, students, and practitioners in Materials Science.

Author
Qin Hu; William O’Neill
Publisher
Elsevier Science; Elsevier ; Elsevier BV (ISSN 0169-4332)
Published
2010
Language
EN
Field
Materials Science (Physical Sciences)

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