About this scholarly article

SPIE Proceedings [SPIE SPIE Lithography Asia - Taiwan - Taipei, Taiwan (Tuesday 4 November 2008)] Lithography Asia 2008 - Use of spin-on-hard mask materials for nano scale patterning technology by Wu, Wen-Hao; Chen, Alek C.; Lin, Burn; Chang, Edward Y.; Cheon, Hwan-Sung; Yen, Anthony; Kim, Sang Kyun; Cho, Hyeon Mo; Yoon, Kyong-Ho; Kim, Jong Seob; Chang, Tuwon; Shin, Seongho is a scholarly article available to read on EtoBox.

Author

Wu, Wen-Hao; Chen, Alek C.; Lin, Burn; Chang, Edward Y.; Cheon, Hwan-Sung; Yen, Anthony; Kim, Sang Kyun; Cho, Hyeon Mo; Yoon, Kyong-Ho; Kim, Jong Seob; Chang, Tuwon; Shin, Seongho

Publisher

SPIE

Published

2008