About this scholarly article

SPIE Proceedings [SPIE Optoelectronics and High-Power Lasers & Applications - San Jose, CA (Saturday 24 January 1998)] Laser Applications in Microelectronic and Optoelectronic Manufacturing III - Low-fluence laser-assisted chemical etching of InP: an XPS study by Moffitt, Christopher E.; Dubowski, Jan J.; Dyer, Peter E.; Wrobel, Jerzy M.; Wieliczka, David M.; Dubowski, Jan J.; Fraser, Jeffrey W. is a scholarly article available to read on EtoBox.

Author

Moffitt, Christopher E.; Dubowski, Jan J.; Dyer, Peter E.; Wrobel, Jerzy M.; Wieliczka, David M.; Dubowski, Jan J.; Fraser, Jeffrey W.

Publisher

SPIE

Published

1998

Language

EN