About this scholarly article

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, United States (Sunday 21 February 2016)] Advances in Patterning Materials and Processes XXXIII - Analyzing block placement errors in SADP patterning by Hohle, Christoph K.; Younkin, Todd R.; Kobayashi, Shinji; Okada, Soichiro; Shimura, Satoru; Nafus, Kathleen; Fonseca, Carlos; Demand, Marc; Biesemans, Serge; Versluijs, Janko; Ercken, Monique; Foubert, Philippe; Miyazaki, Shinobu is a scholarly article available to read on EtoBox.

Author

Hohle, Christoph K.; Younkin, Todd R.; Kobayashi, Shinji; Okada, Soichiro; Shimura, Satoru; Nafus, Kathleen; Fonseca, Carlos; Demand, Marc; Biesemans, Serge; Versluijs, Janko; Ercken, Monique; Foubert, Philippe; Miyazaki, Shinobu

Publisher

SPIE

Published

2016

Language

EN