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Supercritical CO2 reactor for wafer-scale thin film deposition: reactor concept, numerical results, and Cu depositio. by Kondoh, Eiichi; Ueno, Takahiro; Kurita, Shuhei; Watanabe, Mitsuhiro; Yamamoto, Satoshi; Suemasu, Tatsuo is a Engineering article available to read on EtoBox.

It is typically read by researchers, students, and practitioners in Engineering.

Author
Kondoh, Eiichi; Ueno, Takahiro; Kurita, Shuhei; Watanabe, Mitsuhiro; Yamamoto, Satoshi; Suemasu, Tatsuo
Publisher
Elsevier Science; Elsevier ; Elsevier BV (ISSN 0896-8446)
Published
2015
Field
Engineering (Physical Sciences)

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