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About this Engineering article
Flat Band Voltage Shift and Oxide Properties After Rapid Thermal Annealing by B.J. O'Sullivan; P.K. Hurley; F.N. Cubaynes; P.A. Stolk; F.P. Widdershoven is a Engineering article available to read on EtoBox.
It is typically read by researchers, students, and practitioners in Engineering.
- Author
- B.J. O'Sullivan; P.K. Hurley; F.N. Cubaynes; P.A. Stolk; F.P. Widdershoven
- Publisher
- Elsevier Science; Elsevier ; Elsevier BV (ISSN 0026-2714)
- Published
- 2001
- Language
- EN
- Field
- Engineering (Physical Sciences)
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