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About this Engineering article
Thermal atomic layer deposition of Sn metal using SnCl 4 and a vapor phase silyl dihydropyrazine reducing agent by Stevens, Eric C.; Mousa, Moataz Bellah M.; Parsons, Gregory N. is a Engineering article available to read on EtoBox.
It is typically read by researchers, students, and practitioners in Engineering.
- Author
- Stevens, Eric C.; Mousa, Moataz Bellah M.; Parsons, Gregory N.
- Publisher
- AVS (American Vacuum Society); American Vacuum Society; American Institute of Physics (ISSN 0734-2101)
- Published
- 2018
- Language
- EN
- Field
- Engineering (Physical Sciences)
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