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What is Photolithography in IC Manufacturing about?

The document describes the basic steps of the photolithography process using a lift-off technique for patterning integrated circuits. This includes 1) cleaning the silicon wafer using piranha solution, 2) dehydration baking to remove water, 3) coating with a photoresist and soft baking, 4) exposing the resist through a mask, 5) performing a reversal bake, 6) flood exposing and developing the resist, 7) depositing chromium and gold layers, and 8) lifting off the metal not adhered to the developed resist patt

Author

Ham Yas

Language

EN