About this scholarly article

SPIE Proceedings [SPIE Microlithography '99 - Santa Clara, CA (Sunday 14 March 1999)] Optical Microlithography XII - Effect of negative-tone mask lithography on lens aberration phenomena by Tsujita, Kouichirou; Yamauchi, Yuuji; Ueno, Atsushi; Wakamiya, Wataru; Nishimura, Tadashi; Van den Hove, Luc is a scholarly article available to read on EtoBox.

Author

Tsujita, Kouichirou; Yamauchi, Yuuji; Ueno, Atsushi; Wakamiya, Wataru; Nishimura, Tadashi; Van den Hove, Luc

Publisher

SPIE

Published

1999

Language

EN