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About this Engineering article
Improvement on Lithography Pattern Profile by Plasma Treatment by Soo, C. P.; Bourdillon, A. J.; Valiyaveettil, S.; Huan, A.; Wee, A.; Fan, M. H.; Ang, T. C.; Chan, L. H. is a Engineering article available to read on EtoBox.
It is typically read by researchers, students, and practitioners in Engineering.
- Author
- Soo, C. P.; Bourdillon, A. J.; Valiyaveettil, S.; Huan, A.; Wee, A.; Fan, M. H.; Ang, T. C.; Chan, L. H.
- Publisher
- AVS (American Vacuum Society); American Vacuum Society; American Institute of Physics (ISSN 0734-2101)
- Published
- 1999
- Language
- EN
- Field
- Engineering (Physical Sciences)