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About this Engineering article

The effectiveness of HCl and HF cleaning of Si[sub 0.85]Ge[sub 0.15] surface by Sun, Yun; Liu, Zhi; Sun, Shiyu; Pianetta, Piero is a Engineering article available to read on EtoBox.

It is typically read by researchers, students, and practitioners in Engineering.

Author
Sun, Yun; Liu, Zhi; Sun, Shiyu; Pianetta, Piero
Publisher
AVS (American Vacuum Society); American Vacuum Society; American Institute of Physics (ISSN 0734-2101)
Published
2008
Language
EN
Field
Engineering (Physical Sciences)

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