About this scholarly article

2012 IEEE 11th International Conference on Actual Problems of Electronics Instrument Engineering (APEIE) - Problems of plasmachemical etching of Si related to 3D structures formation (technology of Tri-Gate nanotransistors) by Bogmolov, Boris K. is a scholarly article available to read on EtoBox.

Author

Bogmolov, Boris K.

Publisher

IEEE

Published

2012

Language

RU