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About this Engineering article
Effect of Plasma Off Time on the Structure and Electrical Properties of Hydrogenated Amorphous Silicon Carbide Films Prepared by Pulse-Modulated Plasma Deposition by A. Tabata; M. Sekito; T. Mizutani; Y. Suzuoki is a Engineering article available to read on EtoBox.
It is typically read by researchers, students, and practitioners in Engineering.
- Author
- A. Tabata; M. Sekito; T. Mizutani; Y. Suzuoki
- Publisher
- Institute of Pure and Applied Physics; Japan Society of Applied Physics; IOP Publishing (ISSN 0021-4922)
- Published
- 2001
- Language
- EN
- Field
- Engineering (Physical Sciences)
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